Modeling of Epitaxy and Deposition
Thin film epitaxy: Virtual Reactor (VR)
- III-Nitrides
- III-Vs
- CVD SiC, HTCVD of SiC
- CVD Si and SiGe
- HVPE of III-Vs and Oxides, MOCVD of Oxydes
Strain/relaxation during the epitaxy of nitride heterostructures: STREEM InGaN, STREEM AlGaN
Poly-silicon deposition by the Siemens Process: PolySim
Chemical vapor infiltration of SiC: VR-CVI SiC