Modeling of Epitaxy and Deposition

Thin film epitaxy: Virtual Reactor (VR)

• III-Nitrides
• III-Vs
• CVD SiC,  HTCVD of SiC
• CVD Si and SiGe
• HVPE of III-Vs and Oxides, MOCVD of Oxydes

Strain/relaxation during the epitaxy of nitride heterostructures: STREEM InGaN, STREEM AlGaN

Poly-silicon deposition by the Siemens Process: PolySim

Chemical vapor infiltration of SiC: VR-CVI SiC